Characterization of thin films by optical techniques

In this work we have used optical and structural techniques to characterize thin films of ZnO deposited by sputtering on corning glass and monocrystalline silicon substrates. We have used Raman spectroscopy to analyze the type of thin film structure (ZnO) and X-ray diffraction. Optical characterizations include UV-Visible transmittance and optical parameters such as refractive indices layers and their thickness, photoluminescence measurements to deduce the gap of the layers and the levels of defects in the material. Structural characterizations (X-ray diffraction and Raman scattering) reveal a hexagonal W├╝rtzite structure of ZnO. The optical transmission measurements of the layers show that the optical transmission is very high (transmission factor) in the wavelength range located between 400nm and 2500nm.           

This article is published in peer review journal and open access journal, International journal of research in engineering and innovation (IJREI) which have a high impact factor journal for more details regarding this article, please go through our journal website.

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